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EB-PVD equipment
For the manufacture of thermal barrier coatings the institute operates two EB-PVD coaters (EB-PVD: electron beam physical vapour deposition): one single source 60kW coater and one 150kW two source coater equipped with a jumping beam electron gun. Processing parameters are identical to industrial equipment.
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DC/RF-Magnetron Sputter equipment
Due to two separate sources, the magnetron sputtering equipment LA 250S (vonArdenne Anlagentechnik) allows manufacture of metallic or ceramic coatings in monolithic, graded, or multilayer arrangement up to several µm thickness.
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MEGA-Sputteranlage
Die Beschichtungsanlage MEGA (Multiquellen Magnetron Sputter-anlage) ermöglicht durch 7 verschiedene Beschichtungs-Quellen die Herstellung neuartiger metallischer oder keramischer Schichten in monolithischer, gradierter oder auch Mehrlagenanordnung im Bereich bis einigen µm Gesamtschichtdicke.
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